X-RAY METROLOGY TOOLS FOR SEMICONDUCTOR FAB
Metrology Solutions for
process R&D and high-volume manufacturing
WD-XRF TOOLS
WD-XRF: Wavelength Dispersive X-ray Fluorescence Spectrometer | Typically for crystallographic phase, crystallite size (or grain size), and material orientation (or texture) of polycrystalline films.
AZX 400Sequential WD-XRF spectrometer
Analytical flexibility for process R&D and low-volume manufacturing and high-product-mix |
WDA-3650SIMULTANEOUS WD-XRF spectrometer
Film thickness and composition measurements on blanket wafers |
Waferx 310SIMULTANEOUS WD-XRF spectrometer
In-line, simultaneous WD-XRF spectrometer for high-volume manufacturing |
XRR, ED-XRF & OPTICAL TOOLS
XRR: X-ray Reflective Spectrometer | Typically for characterization of a multilayered sample
ED-XRF: Energy-dispersive X-ray fluorescence (ED-XRF) spectrometer
OPTICAL TOOLS: Hybrid wafer metrology combining micro-spot ED-XRF and 2D microscope, and 3D scanner for In-line non-destructive inspection and metrology.
ONYX 3000Micro-spot ED-XRF and Optical Inspection (2D-3D)
In-line non-destructive inspection and metrology for the semiconductor and micro-electronics industries ≤300 mm wafers |
xhemis® ex-2000ED-XRF and XRR for High-Volume Manufacturing
Thickness, density, roughness, and composition of films on blanket wafers metrology tool for blanket wafers ≤200 mm |
xTRAIA® MF-2000Process XRR, ED-XRF, and XRD Metrology Fab Tool
Blanket and patterned metal layer thickness and composition
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xTRAIA® MF-3000XRR, ED-XRF, XRD Metrology Optimized for High-Volume Manufacturing
Blanket and patterned metal layer thickness and composition
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TXRF TOOLS
TXRF: Total Reflection X-ray Fluorescence | Typically for surface contamination
TXRF 3760COMPACT TXRF SPECTROMETER
Wafer Surface Contamination Metrology
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TXRF310FabTXRF SPECTROMETER FOR HVM
For The Highest Throughput Wafer Surface Contamination Metrology
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TXRF-V310INTEGRATED VPD-TXRF SPECTROMETER
For The Highest Sensitivity Wafer Surface Contamination Metrology
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COMPOUND SEMICONDUCTOR METROLOGY TOOLS
TXRF 3760COMPACT TXRF SPECTROMETER
Wafer Surface Contamination Metrology |
WDA-3650SIMULTANEOUS WD-XRF spectrometer
Film thickness and composition measurements on blanket wafers |
SmartLabLAB TOOL AUTOMATED MULTI-PURPOSE X-RAY DIFFRACTION
XRR, XRD, Rocking Curve, and RSM |
XRT MICRON
LAB TOOL X-RAY TOPOGRAPHY
X-ray Topography Imaging System |
Film thickness/composition and wafer contamination tools
Rigaku is a pioneer and world leader in designing and manufacturing X-ray technology-based instrumentation to solve manufacturing challenges in semiconductor R&D and production. With more than 35 years of global market leadership in this industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization. Rigaku X-ray Diffraction (XRD), X-ray Fluorescence (XRF), X-ray Reflectometry (XRR), and X-ray topography (XRT) metrology tools measure critical parameters like thin film: thickness, composition, roughness, density, porosity, and crystal structure and crystal structure defects. In addition, we offer Total process Reflection X-ray Fluorescence (TXRF) and Vapor Phase Decomposition-Total Reflection X-ray Fluorescence (VPD-TXRF) tools for at-line or in-line surface contamination measurements. With global 24/7 service and support, Rigaku delivers cutting-edge solutions for yield enhancement and process development.